Techinal Specification Of Positive PlatePlate Type:positive Substrate: aluminumGauge Available: 1.5MM-3.0MMAlloy aluminum alloy : 1050H18Handling: against moisture ,against heat, shadyLight Source and Exposure: 140-200mj/m2 (1)2000W lamp with gallium lodide (80-100
seconds ); (2)3000w lamp with gallium lodide (40-60 seconds); (3) 5000w lampwith gallium lodide 20-40 seconds . Developer: develop solution or powder of positive ps plate can be used in developing
Dot reproduction ability: 2-98%Definition: 8-10 umDensity of plate substrate background color:less than or equal to 0.01The mass per unite area of sensitive layer: 2.0-2.5 g/m2The mass per unit area of oxide layer: 2.0-3.5 g/m2Developing Temperature: 23degrees centigrade+/-2degrees centigradeDeveloping Time:30-60secondsDeletion: In order to eliminate the unnecessary image and spot in the plate after
washing with developer, a little plate modification prescription (for eliminating
images) can be coated on the elimination place, keep it for one minute, thenwash it with water and coat it with gum.Shelf time: 18 monthLength of Run:50,000-100,000Process: exposure, develop, plate modification, gumming, roast plate, printing

Offset Printing Plate(PS Plate,positive ps plate)